发明名称 Method for determining a reliable oxide thickness
摘要 A method for determining a reliable gate oxide thickness for a transistor involves subjecting test transistors to an alternating current (AC) voltage until the test transistors break down. The breakdown times of the test transistors are measured and correlated with the corresponding gate oxide thickness of the test transistor to form a reliability model of the transistor. The reliable gate oxide thickness is determined by extrapolating the reliability model out to a predetermined period of time for which reliability is desired, for example, ten years.
申请公布号 US6133746(A) 申请公布日期 2000.10.17
申请号 US19980163414 申请日期 1998.09.30
申请人 ADVANCED MICRO DEVICES, INC. 发明人 FANG, PENG;FANG, HAO
分类号 G01N27/92;H01L23/544;(IPC1-7):G01N27/92;G01R31/12;H01L21/66 主分类号 G01N27/92
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