| 摘要 |
<p>PROBLEM TO BE SOLVED: To form a stabilized good pattern regardless of a standby time from exposure to development by continuously conducting a heating step and a developing step when carrying out a pattern processing of a heat-resistant resin precursor composition. SOLUTION: When the top surface of a substrate is coated with a heat- resistant resin precursor composition, then prebaked, subsequently exposed and then continuously developed, heat treatment is carried out before the development to thereby stably form a good pattern. The substrate coated with the above composition, prebaked and exposed is preferably subjected to the heat treatment and development while being moved. The substrate is preferably a material of continuous length, preferably a rolled material. The heat treatment and development are preferably successively and continuously conducted while unwinding and winding the roll. The development is preferably carried out after the passage of a prescribed time (preferably 3 s to 30 min) from the heat treatment. The heat treatment is preferably conducted at 50-200 deg.C heat-treating temperature for 3 s to 30 min heat-treating time.</p> |
