发明名称 |
Photoelectric conversion device and method manufacturing same |
摘要 |
Catalytic elements such as Ni are intentionally combined with defects that remain inside of a semiconductor substrate or thin film so that the energy state of the defects comes to a stable state. In this state, a heat treatment is conducted in an atmosphere containing halogen element or XV element, and gettering is conducted in such a manner that the catalytic element is taken in an oxide film. The bonds which are divided by separating the catalytic element are recombined through a heat treatment, thereby being capable of improving crystalline property of the semiconductor substrate or thin film remarkably.
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申请公布号 |
US6133119(A) |
申请公布日期 |
2000.10.17 |
申请号 |
US19970890439 |
申请日期 |
1997.07.09 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI, SHUNPEI |
分类号 |
H01L21/20;H01L21/22;H01L21/223;H01L21/225;H01L21/288;H01L21/322;H01L31/0216;H01L31/0236;H01L31/068;H01L31/18;(IPC1-7):H01L21/322 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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