发明名称 Photoelectric conversion device and method manufacturing same
摘要 Catalytic elements such as Ni are intentionally combined with defects that remain inside of a semiconductor substrate or thin film so that the energy state of the defects comes to a stable state. In this state, a heat treatment is conducted in an atmosphere containing halogen element or XV element, and gettering is conducted in such a manner that the catalytic element is taken in an oxide film. The bonds which are divided by separating the catalytic element are recombined through a heat treatment, thereby being capable of improving crystalline property of the semiconductor substrate or thin film remarkably.
申请公布号 US6133119(A) 申请公布日期 2000.10.17
申请号 US19970890439 申请日期 1997.07.09
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI, SHUNPEI
分类号 H01L21/20;H01L21/22;H01L21/223;H01L21/225;H01L21/288;H01L21/322;H01L31/0216;H01L31/0236;H01L31/068;H01L31/18;(IPC1-7):H01L21/322 主分类号 H01L21/20
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