发明名称 Materials for selective deposition modeling
摘要 A novel thermopolymer material adapted for use in thermal stereolithography. More particularly, a thermopolymer material comprising a mixture of: a low shrinkage polymer resin; a low viscosity material such as paraffin wax; at least one microcrystalline wax; a toughening polymer; a plasticizer. Alternative embodiments further include components to improve the materials ability to transfer heat and to improve strength. The subject material, together with the described process greatly reduce part building distortions while retaining desirable toughness, strength and jetting properties.
申请公布号 US6133355(A) 申请公布日期 2000.10.17
申请号 US19970873389 申请日期 1997.06.12
申请人 3D SYSTEMS, INC. 发明人 LEYDEN, RICHARD N.;HULL, CHARLES W.;THAT, DINH TON
分类号 B29C35/08;B29C41/02;C08K5/04;(IPC1-7):C08K5/04 主分类号 B29C35/08
代理机构 代理人
主权项
地址