发明名称 Boron doped silicon capacitor plate
摘要 A nonvolatile memory device utilizing a program junction region of a p-type impurity and oxide grown thereon. In one aspect, the device comprises a programming structure and a program junction separated from said programming structure by a field oxide region. A program junction oxide layer overlies said program junction region. A floating gate is provided over the oxide which covers said programming structure, said program junction oxide layer, and in some embodiments the gate oxide of a sense transistor.
申请公布号 AU4023500(A) 申请公布日期 2000.10.16
申请号 AU20000040235 申请日期 2000.03.22
申请人 LATTICE SEMICONDUCTOR CORPORATION 发明人 CHRISTOPHER O. SCHMIDT;SUNIL D. MEHTA;XIAO-YU LI
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
代理机构 代理人
主权项
地址
您可能感兴趣的专利