发明名称 REACTION CHAMBER HAVING MULTI CHAMBER WALLS
摘要 PURPOSE: A reaction chamber having multi chamber walls is provided to prevent a particle from generating and to increase a uniformity of a layer by decreasing the inner space of a chamber walls because of two chamber walls. CONSTITUTION: A reaction chamber having multi chamber walls comprises a first chamber wall(80a), a second chamber wall(80b), a gas injection unit and a heat supplying unit. The second chamber wall is formed on the inner wall of the first chamber, separated a constant interval from the first chamber wall. The gas injection unit supplies reaction gas to the inside of the second chamber wall. The heat supplying unit supplies heat to the inside of the second chamber wall.
申请公布号 KR20000061060(A) 申请公布日期 2000.10.16
申请号 KR19990009838 申请日期 1999.03.23
申请人 SAMSUNG ELECTRONICS CO, LTD. 发明人 KIM, YEONG DEOK
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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