ORGANIC IRREGULAR REFLECTION PREVENTING POLYMER AND PROCESS FOR PREPARATION THEREOF

摘要

PURPOSE: Novel organic compound capable of being used as a reflection preventive film in the process of forming a microfine pattern using 193 nm ArF and 248 nm KrF in the process of manufacturing a semiconductor device and process for producing the same are provided which can prevent reflection of a lower film layer and remove standing waves. CONSTITUTION: An irregular reflection preventing composition containing an irregular reflection preventing polymer, irregular reflection preventing film using the same and process for producing the same are described. By using the polymer as a reflection preventing film in the process of forming a microfine pattern in the process of manufacturing a semiconductor device, standing waves by change of optical property of a lower film layer on a wafer and the thickness of photoresist, reflective notching and the change of critical dimension(CD) caused by a lower film can be removed such that stable microfine pattern of 64M, 256M, 1G, 4G, 16G and 16DRAM can be formed.