| 摘要 |
PURPOSE: An apparatus for aligning a wafer is provided to promptly check an alignment state of the wafer. CONSTITUTION: An apparatus for aligning a wafer(180) includes a halogen lamp(110) for generating a reference light, an alignment index(120) wherein a plurality of horizontal shafts search alignment marks are horizontally formed in right and left sides in vertical shaft direction and a plurality of vertical shaft search alignment marks are horizontally formed in up and down sides in horizontal shaft direction, an optical path provider(130) for providing a straight path of a light to irradiate the reference light to the alignment marks of the wafer and providing a reverse path of the light to transmit the light reflected from the wafer to the alignment index, a beam splitter for dividing the image formed on the alignment index into a first path and a second path and transmitting, a first imaging element(150) for imaging with scanning the image through the first path in horizontal shaft direction, a second imaging element(160) for imaging with scanning the image through the second path in vertical shaft direction, and an alignment state detecting part(170) for detecting a horizontal shaft alignment state of the wafer by comparing a horizontal shaft center of the alignment index and a horizontal shaft center of a wafer multi mark and detecting a vertical shaft alignment state of the wafer by comparing a vertical shaft center of the alignment index and a vertical shaft center of the wafer multi mark.
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