APPARATUS FOR SUPPLYING GAS INTO CHAMBER FOR METAL ORGANIC CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: An apparatus for supplying gas into a CMP chamber is provided to prevent the metal source from being dissolved by coating a thin film on a surface of a metal disc. CONSTITUTION: A gas supplying apparatus comprises an evaporating device. The evaporating device includes an injection tube(322) for injecting a metal source through a hole(323) formed therein. The evaporating device also includes a disc(324) for preventing the evaporated source gas from thermally being dissolved. The disc(324) allows the metal source to be distributed in a large area. The disc(324) is coated with a thin film which is made of nonconductor material. The metal source is stored in a source storing device. The metal source is pumped by a pumping device.