APPARATUS FOR PICKING THE CONTAMINANT SAMPLE FROM THE SURFACE OF A SEMICONDUCTOR WAFER

摘要

PURPOSE: An apparatus for picking the contaminant sample is provided to improve the reliance of the wafer analysis by removing the interference contamination while the picking process is being carried out. CONSTITUTION: An apparatus for picking the contaminant sample comprises a chamber(12). A table(20) on which a wafer(80) is placed is installed in the chamber(12). A vessel(50) has a first solution for oxidizing an oxide film of a surface of the wafer(80). An injecting device is provided to inject a second solution for scanning the surface of the wafer(80). The table(20) is rotated by a rotating device in such a manner that the surface of the wafer(80) is scanned by the second solution. The vessel is heated by a heating plate(34) so as to evaporate the first solution. Therefore, the first solution cab can be rapidly coated on the surface of the wafer(80).