| 摘要 |
PURPOSE: A reflection panel of a reflective liquid crystal display is provided to be capable of reducing a cost and a process number required to prepare an unevenness material, by forming an unevenness section by use of a gate insulation film and a passivation film. CONSTITUTION: A substrate(21) has a pixel region, a transistor region and a gate pad region. A gate electrode(22), a gate signal line and a gate pad(23) are formed on the substrate(21). A gate insulation film(24) is formed so as to have an open gate pad region. An insulation-film unevenness layer(31a) is formed on a pixel region and is made of the same material as the gate insulation film(24). A semiconductor layer(25) is formed on the gate insulation film(24) of the transistor region, and an ohmic layer(26) is formed on the semiconductor layer(25). Source and drain electrodes(27,28) are formed on the ohmic layer(26). A passivation film(29) has a contact hole(30) and an open gate pad region and is formed at a region except for the pixel region. An unevenness layer(31b) is made of the same material as the passivation film(29) and is formed on the unevenness layer(31a). A reflection electrode(32) is connected to the drain electrode(28) via the contact hole(30) and is formed on the pixel region.
|
