| 摘要 |
PURPOSE: An apparatus for controlling pressure for manufacturing semiconductor device is provided to control vortex in an etch chamber and to impurity particles, by improving the structure of a pressure control valve. CONSTITUTION: An apparatus for controlling the pressure of a processor chamber(100) for manufacturing semiconductor device comprises a pump(210), a pumping line(220), a pressure control valve(230) and a motor(240). The pump pumps the processor chamber. The pumping line provides an air transfer path according to the pumping operation of the pump, of which one end is connected to the pump and the other end is connected the top surface of the processor chamber. And, the pressure control valve moves in the vertical direction to switch on/off the path between the processor chamber and the pumping line, of which the side surface is connected to the pump and the bottom end surface is connected to the top surface of the processor chamber. Finally, the motor enables the pressure control valve to move in the vertical direction.
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