POLISHING HEAD STRUCTURE OF CHEMICAL MECHANICAL POLISHING FACILITIES

摘要

PURPOSE: A polishing head structure of chemical mechanical polishing(CMP) facilities is provided to exhaust a sludge from a bottom of an end effector to the outside by forming a penetration hole. CONSTITUTION: A polishing head structure of chemical mechanical polishing(CMP) facilities having a holder(30), a magnet(32) and an end effector(34) with a plurality of vertically-penetrated holes, comprises a supporting element(38) and a penetration hole(40). The supporting element is established between the end effector and the magnet. Therefore, a space is formed to have the plurality of holes of the end effector aligned. The penetration hole penetrates the holder and magnet in a vertical direction to have the space between the end effector and magnet go through the outside.