| 摘要 |
PURPOSE: A method for preventing a particle from being re-absorbed to a wafer is provided to decrease a re-absorption rate of the particle to the wafer, by inclining the wafer to be in parallel to the absorption direction of the particle in cleaning the wafer, and by putting the wafer into a cleaning liquid. CONSTITUTION: In a method for preventing a particle from being re-absorbed to a wafer, the wafer is soaked into a cleaning liquid in cleaning the wafer while inclined to be in parallel to the resultant direction of an electrostatic attraction and gravity affecting the particle, so that the wafer can go beyond the range of the absorption of the particle.
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