发明名称 A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
摘要 PURPOSE: A method for manufacturing a semiconductor integrated circuit is provided to produce a crystalline silicon film having a high mobility in which an amorphous silicon film is crystallized by using a metal element for accelerating crystallization. CONSTITUTION: In the device, An oscillator(2) for emitting laser light is provided on a base(1). Full-reflection mirrors(5,6) are arranged on an optical path on the light emission side of the oscillator(2). An amplifier(3), full-reflection mirrors(7,8), an optics(4), and a full-reflection mirror(9) are arranged in this order on an optical path on the reflection side of the full-reflection mirror(6). A stage on which a sample(11) is mounted is disposed on an optical path extending downward from the full-reflection mirror(9).
申请公布号 KR100268524(B1) 申请公布日期 2000.10.16
申请号 KR19970069753 申请日期 1997.12.17
申请人 SEMICONDUCTOR ENERGY LABORATORY K.K. 发明人 KOICHIRO, TANAKA;NAOAKI, YAMAGUCHI
分类号 H01S3/10;(IPC1-7):H01S3/10 主分类号 H01S3/10
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