发明名称 |
APPARATUS FOR MAINTAINING ILLUMINANCE OF EXPOSED BEAM SOURCE |
摘要 |
PURPOSE: An apparatus for maintaining the illuminance of an exposed beam source is provided to reduce the manufacturing cost of articles by increasing the productivity of articles per time. CONSTITUTION: An illuminance maintaining apparatus comprises a voltage supplying device(210) for supplying the voltage to a beam source(10). A voltage varying device(220) varies the voltage supplied to the beam source(10) from the voltage supplying device(210). The illuminance of the beam radiated from the beam source(10) is sensed by an illuminance sensing device(230). A microcomputer(240) is provided to control the voltage variation of the voltage varying device(220) such that the illuminance detected by the illuminance sensing device(230) is maintained with a predetermined illuminance.
|
申请公布号 |
KR20000061439(A) |
申请公布日期 |
2000.10.16 |
申请号 |
KR19990010479 |
申请日期 |
1999.03.26 |
申请人 |
ANAM SEMICONDUCTOR., LTD. |
发明人 |
LEE, GWANG SEONG;LEE, CHANG NAM |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|