APPARATUS FOR COMPENSATING FOR VARIATION OF ION INJECTION QUANTITY OF ION INJECTION FACILITIES

摘要

PURPOSE: An apparatus for compensating for a variation of ion injection quantity of ion injection facilities is provided to prevent an overdose by precisely integrating ion quantity in a chamber. CONSTITUTION: An apparatus for compensating for a variation of ion injection volume of ion injection facilities in which an ion beam(15) generated in a source unit(11) passes through plates(18) and is injected into a wafer of a conveying unit established inside a chamber(17) of an end station(14), comprises a vacuum control unit. The vacuum control unit is established at an external side of a chamber to maintain a constant vacuum within a chamber, to precisely integrate ion quantity.