MANUFACTURING MATHOD OF HOLOGRAM

摘要

PURPOSE: A method for manufacturing a hologram is provided to stabilize an optical reaction by forming a full reflective hologram of a surface unevenness type. CONSTITUTION: A hologram is recorded by using a photoresist located on an upper face of a crystal layer(14). A developing process for the photoresist is performed. A masking material is applied on the upper face of the developed photoresist. The applied masking material is etched selectively. The photoresist layer located at a lower portion of the etched masking material is etched. The crystal layer(14) is etched. The photoresist and the masking material are removed from the crystal layer(14).