METHOD FOR FABRICATING THIN-FILM SUBSTRATE AND THIN-FILM SUBSTRATE FABRICATED BY THE METHOD

摘要

Supports (3) are arrayed on a support base (1). A sacrifice layer (15) of a resin material is formed and planarized until the tops of the supports (3) are exposed. A thin-film substrate (5) is formed on the planarized sacrifice layer (15) and supports (3). The sacrifice layer (15) is removed by plasma selective etching through the thin-film substrate. Thus, a large-area thin-film substrate (5) spaced by the height of a space (7) from the support base (1) is fabricated.