发明名称 THE METHOD AND THE APPARATUS FOR PLASMA GENERATION
摘要 <p>The present invention relates to a plasma technology and can be used in low-power and movable plasma generating microwave devices. A method based on initiation of a discharge in a gas medium by means of electromagnetic microwave for utilizing a low-power microwave source the intensity of the electromagnetic field is increasing. An apparatus for realization of this method containing a microwave source, a gas-filled discharge chamber with a conducting initiator disposed in the chamber. The apparatus differs from the like devices for it is complemented by a cavity resonator and the initiator disposed simultaneously in the discharge chamber and the resonator. One end of the initiator disposed in the discharge chamber is located in the antinode area of the standing wave which forms in the discharge chamber while the other end is disposed in the antinode area of the standing wave being formed in the resonator. A microwave magnetron serves as a microwave source. The magnetron radiating element is disposed within the cavity resonator with a resonant frequency corresponding to that of the microwave magnetron working frequency.</p>
申请公布号 WO2000060910(A1) 申请公布日期 2000.10.12
申请号 RU1999000428 申请日期 1999.11.11
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