发明名称 ENDPOINT DETECTION IN THE FABRICATION OF ELECTRONIC DEVICES
摘要 A chamber (28) comprises a radiation source (58) capable of emitting radiation having a wavelength that is substantially absorbed in a predetermined pathlength in a thickness of a layer (22) on a substrate, and a radiation detector (62) adapted to detect the radiation. The radiation is substantially absorbed in a first thickness of the layer (22), and after at least partial processing of the layer (22), is at least partially transmitted through a second thickness of the layer (22) and reflected by one or more underlayers (24) of the substrate (20).
申请公布号 WO0060657(A1) 申请公布日期 2000.10.12
申请号 WO2000US07070 申请日期 2000.03.16
申请人 APPLIED MATERIALS, INC. 发明人 GRIMBERGEN, MICHAEL, N.;LILL, THORSTEN, B.
分类号 C23C14/54;C23C16/44;C23C16/52;G01B11/06;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01L21/66;H01J37/32 主分类号 C23C14/54
代理机构 代理人
主权项
地址