发明名称 |
ENDPOINT DETECTION IN THE FABRICATION OF ELECTRONIC DEVICES |
摘要 |
A chamber (28) comprises a radiation source (58) capable of emitting radiation having a wavelength that is substantially absorbed in a predetermined pathlength in a thickness of a layer (22) on a substrate, and a radiation detector (62) adapted to detect the radiation. The radiation is substantially absorbed in a first thickness of the layer (22), and after at least partial processing of the layer (22), is at least partially transmitted through a second thickness of the layer (22) and reflected by one or more underlayers (24) of the substrate (20).
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申请公布号 |
WO0060657(A1) |
申请公布日期 |
2000.10.12 |
申请号 |
WO2000US07070 |
申请日期 |
2000.03.16 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
GRIMBERGEN, MICHAEL, N.;LILL, THORSTEN, B. |
分类号 |
C23C14/54;C23C16/44;C23C16/52;G01B11/06;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01L21/66;H01J37/32 |
主分类号 |
C23C14/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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