发明名称 MEMORY CELL ARRANGEMENT AND METHOD FOR PRODUCING SAME
摘要 The invention relates to a transistor of a memory cell. The transistor is provided with an upper (S/Do) and a lower source/drain region. Said regions are situated between two first grooves (G1) and two second grooves that extend crosswise thereto. An insulated word line (W) overlaps the upper source/drain region (S/Do) and is provided with protuberances which extend into the second grooves (G2). A conductive structure (L) that is arranged in one of the first grooves (G1) and is laterally adjacent to the upper source/drain region (S/Do) is contacted by a contact (K) on the top of said structure. The contact (K) is arranged between adjacent word lines (W) and is connected to a condenser (P1, Kd, P2) of the memory cell, whereby said condenser is arranged above the word lines.
申请公布号 WO0060667(A1) 申请公布日期 2000.10.12
申请号 WO2000DE00932 申请日期 2000.03.27
申请人 SIEMENS AKTIENGESELLSCHAFT;SELL, BERNHARD;WILLER, JOSEF;SCHUMANN, DIRK;REISINGER, HANS 发明人 SELL, BERNHARD;WILLER, JOSEF;SCHUMANN, DIRK;REISINGER, HANS
分类号 H01L21/8242;H01L21/8246;H01L27/105;H01L27/108 主分类号 H01L21/8242
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