| 摘要 |
<p>A hard polishing pad made of a nonfoaming material and used for a CMP machine. In the surface of the polishing pad, a spiral groove or concentric grooves and grid grooves are combinedly made. The angles at which the grooves intersect are two degrees or more. There are no edges having a radius of curvature of 50 νm or less on the surface. Consequently, no burrs are produced, and the object being polished is not scratched, thereby improving the polishing rate.</p> |
