| 摘要 |
Compounds of formula I, II and III, wherein <EMI ID=1.1 HE=38 WI=157 LX=264 LY=579 TI=CF> <PC>wherein R<SB>1</SB> is for example hydrogen, C<SB>1</SB>-C<SB>12</SB>alkyl, C<SB>3</SB>-C<SB>30</SB>cycloalkyl, C<SB>2</SB>-C<SB>12</SB>alkenyl, C<SB>4</SB>-C<SB>8</SB>cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R<SB>1</SB> with the exception of hydrogen can additionally be substituted by a group having a -O-C-bond or a -O-Si-bond which cleaves upon the action of an acid; R'<SB>1</SB> is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R<SB>2</SB> is halogen or C<SB>1</SB>-C<SB>10</SB>haloalkyl; R<SB>3</SB> is for example C<SB>1</SB>-C<SB>18</SB>alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R<SB>3</SB> is e.g. C<SB>2</SB>-C<SB>6</SB>haloalkanoyl, or halobenzoyl, R'<SB>3</SB> is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as phototsensitive acid-donors in chemically amplified resist formulations.
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