发明名称 |
Method for forming thin film |
摘要 |
<p>The present invention provides a method for forming thin films, wherein thin films with a uniform thickness can be formed on substrates as objects such as spheroids, even when the films are formed by conventional film-formation methods using an incident particle beam coming from a specific direction (e.g., evaporation and sputtering). In the method, thin films are formed on substrates such as spheroids with an incident particle beam coming from a particle source located in a specific direction by performing a spin motion together with a swing motion. The spin motion is a rotation of the substrate at a constant angular velocity about the spheroidal axis. The swing motion is a rotational oscillation of the same substrate for rotationally oscillating the axis at a constant cycle in one surface, where the center of the rotational oscillation is in the vicinity of the midpoint between two focal points on the axis of the spheroid. As a result, thin films with a uniform thickness in both the peripheral direction of the substrate and in the rotational axis direction of the spin motion can be formed even on substrates including spheroids. <IMAGE></p> |
申请公布号 |
EP1043418(A2) |
申请公布日期 |
2000.10.11 |
申请号 |
EP20000107104 |
申请日期 |
2000.04.06 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
OMATA, YUUJI;HASHIMOTO, NAOTAKA;YOKOYAMA, MASAHIDE;SUEMITSU, TOSHIYUKI;KITAI, TAKAHIRO |
分类号 |
C23C14/50;H01J9/20;H01K1/32;H01K3/00;(IPC1-7):C23C14/50 |
主分类号 |
C23C14/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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