发明名称 CoPt SPUTTERING TARGET, ITS PRODUCTION, MAGNETIC RECORDING FILM AND CoPt MAGNETIC RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To produce a CoPt sputtering target capable of obtaining a magnetic recording medium having a recording layer uniform in film characteristics and excellent in recording and reproducing characteristics, to provide a method for producing the same, to produce a magnetic recording film and to produce a CoPt magnetic recording medium. SOLUTION: This CoPt sputtering target is composed of a target material essentially consisting of Co, mainly consisting of Pt and contg. at least one or more kinds among elements selected from the group 4a elements, 5a elements, 6a elements, B and C, in which, in the target structure, the maximum inscribed circle diameter of the phase substantially composed of Pt single substance is substantially controlled to <=500μm, and the layer thickness of a diffusion layer lying on the boundary of the Pt phases is substantially controlled to <=50μm. By this target, a magnetic recording film used for a hard disk, or the like, having a uniform Pt distribution in which the difference in the analyzed value of the Pt content measured in the radial direction of the disk is <=±10% can be obtd.
申请公布号 JP2000282229(A) 申请公布日期 2000.10.10
申请号 JP19990085414 申请日期 1999.03.29
申请人 HITACHI METALS LTD 发明人 TAKASHIMA HIROSHI
分类号 B22F3/14;C22C19/07;C23C14/34;G11B5/85;G11B5/851;H01F10/00;H01F10/16;H01F41/18;(IPC1-7):C23C14/34;B22F3/15 主分类号 B22F3/14
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