发明名称 CHEMICAL TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To reduce running costs and to implement anti-pollution measures by precipitating or flocculating foreign materials and particles by an electric field in the circulation system of an isopropyl alcohol aqueous solution to be used in a rinse chamber installed between a chemical liquid treatment chamber and a water washing chamber. SOLUTION: A rinse chamber 4a is installed between a treatment chamber 2 and a water washing chamber 4b, an isopropyl alcohol(IPA) aqueous solution 33a is supplied as a rinse liquid to a substrate 50. An electric field foreign material removing apparatus 70 is added to the circulation system of the IPA aqueous solution 33a, dry gas supply piping 24 for draining the IPA aqueous solution 33a is installed on the outlet side of the rinse chamber 4a, and a draining nozzle 60 which ejects dry gas to the substrate 50 in the shape of a sheet is arranged at the tip of the piping 24. The rinse liquid 33a after draining is circulated by way of the apparatus 70 and a filter 47. In this way, the rinse liquid is made to be used for a long time by removing foreign materials so that the consumption of IPA and the amount of high concentration drainage to be industrial waste are reduced to reduce waste treatment costs.
申请公布号 JP2000279900(A) 申请公布日期 2000.10.10
申请号 JP19990087352 申请日期 1999.03.30
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KAWASAKI KIYOHIRO
分类号 B08B3/08;H01L21/304;(IPC1-7):B08B3/08 主分类号 B08B3/08
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