| 摘要 |
PROBLEM TO BE SOLVED: To easily remove an organic film deposited on a mask without using etching by plasma and without breaking a vacuum by subjecting the organic film to heating treatment. SOLUTION: Since an organic film is evaporated or sublimated at a relatively low temp. (about <=300 deg.C) in a vacuum, by heating the mask to a temp. higher than the evaporating temp. or sublimating temp. of the material deposited on the mask, the film can be removed. The evaporated content of the film deposited on the mask redeposits on a part low in temp. of a deposition preventive board or the like. Furthermore, in the case there is a shutter for preventing radiation heat directly above an evaporating source crucible, the organic material in the crucible does not evaporate. Since the exchange of the mask at the time of maintenance is not required, the positioning of the mask may be executed only at the time of its setting at first. For heating the mask, a method of using a heater capable of radiation heating or conduction heating, a method of directly flowing electric current through the mask and generating Joule heat, a method by induction heating, or the like, can be given.
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