发明名称 |
SURFACE PROCESSING OF DIAMOND SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a process for the surface processing of a diamond substrate capable of keeping the flatness of the processing surface. SOLUTION: An iron plate 13' having a pattern is pressed against a polycrystalline diamond substrate 12 and heated at a high temperature to transfer the pattern to the surface of the polycrystalline diamond substrate 12. The heating is carried out in vacuum. Since the carbon atoms or molecules constituting the polycrystalline diamond substrate 12 are diffused into the iron plate 13' by the pressing and heating, the surface of the polycrystalline diamond substrate 12 is processed in the form of the surface pattern of the iron plate 13'.
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申请公布号 |
JP2000281488(A) |
申请公布日期 |
2000.10.10 |
申请号 |
JP19990093499 |
申请日期 |
1999.03.31 |
申请人 |
HAMAMATSU PHOTONICS KK |
发明人 |
FURUTA SHINICHI;MIYAJIMA HIROBUMI;SUGA HIROBUMI |
分类号 |
H01L21/302;B01J3/00;B01J19/12;C30B29/04;H01L21/3065;(IPC1-7):C30B29/04;H01L21/306 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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