| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an ultrafine structure of a high aspect ratio with superior productivity. SOLUTION: The fine structure can be manufactured by carrying out the following steps in the order named: a preliminary step where an extra thin film 12 of an organic compound having <=10 nm film thickness is formed on the surface of a base material 10; a first step where the vicinity of the surface of the base material is scanned by the use of a probe 14 of a scanning probe microscope to selectively remove, change, or decompose the extra thin film of the organic compound and form a prescribed pattern; and a second step where a fine structure 20 is formed on the surface of the base material on the basis of a prescribed pattern by using an electroless plating process. Further, etching can be applied to an undercoat layer by using this fine structure 20 as a mask.
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