发明名称 |
Method for forming semiconductor structures using a calibrating reticle |
摘要 |
A device and method to prepare a stepper to form semiconductor structure lines by using a calibration reticle to determine optimum numerical aperture and partial coherence values for the stepper. The calibration reticle includes a light-transmissive substrate having a plurality of patterns disposed thereon, each of the plurality of patterns including a series of structures of a constant size spaced an equal distance from one another and having a predetermined pitch intended to mimic a pitch value of a semiconductor structure reticle. The method includes positioning the calibration reticle on a stepper and optimizing the performance characteristics (e.g., the partial coherence value and the numerical aperture value) of the stepper using one of the patterns of the calibration reticle corresponding to a predetermined pitch of a semiconductor structure reticle.
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申请公布号 |
US6130016(A) |
申请公布日期 |
2000.10.10 |
申请号 |
US19990288688 |
申请日期 |
1999.04.09 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
KENT, ERIC R. |
分类号 |
G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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