| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist composition which can give a resist excellent in lithographic performances by compounding a resin obtained by reacting the prepolymer obtained by reacting a methylolated phenol compound in the presence of an acid with a phenolic compound with a photoactive component. SOLUTION: The methylolated phenol compound used is particularly desirably a phenol having a plurality of alkylhydroxyl groups. The reaction is performed at a temperature higher than room temperature. The acid used is a mineral acid, an organic acid, or the like. It is preferable that the reaction is performed in the presence of a solvent. The reaction product is reacted with a methylolated phenol compound such as a monohydroxymethylphenol compound or a bishydroxymethylphenol compound, etc. It is preferable that the reaction is performed in the absence of an aldehyde. The photoactive component used is desirably a phenol resin having naphthoquinone ester groups or a diazonaphthoquinone compound as well as its oligomer. |
