发明名称 CORROSION INHIBITOR FOR METAL, CLEANING LIQUID COMPOSITION CONTAINING THE SAME AND CLEANING USING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain a corrosion inhibitor for a metal without corrosiveness when cleaning a metal, especially copper or a copper alloy, a cleaning liquid composition capable of removing impurities without corroding a copper wiring by adding the corrosion inhibitor to a cleaning liquid for a semiconductor device having a metal wiring, especially the copper wiring and to provide a method for cleaning using the cleaning liquid composition. SOLUTION: This corrosion inhibitor for a metal comprises one or more kinds of compounds selected from imidazoles, thiazoles and triazoles having at least one amino group or at least one thiol group in the molecule. The cleaning liquid composition is obtained by adding the corrosion inhibitor to a cleaning liquid suitable for cleaning a metal to be cleaned. The method for cleaning uses the cleaning agent composition.
申请公布号 JP2000282096(A) 申请公布日期 2000.10.10
申请号 JP19990093774 申请日期 1999.03.31
申请人 ASAHI KAGAKU KOGYO CO LTD;SUMITOMO CHEM CO LTD 发明人 OTA KOJI;TAKASHIMA MASAYUKI
分类号 C11D7/34;C11D7/32;C23F11/16;C23G1/06;C23G1/18;(IPC1-7):C11D7/34 主分类号 C11D7/34
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