发明名称 Gas tube with heating apparatus
摘要 A gas tube with heating apparatus. The gas tube is applicable in a chemical vapor deposition machine. The gas comprises a gas circulating tube and a coaxial gas tube invaginating a gas transporting tube therein. A heater is installed in the gas circulating tube, while the coaxial tube is covered by a thermal insulating layer. In addition, a control valve, a pressure gauge, and a particle trap are installed in a gas supplying tube connecting with the gas circulating tube.
申请公布号 US6129043(A) 申请公布日期 2000.10.10
申请号 US19990257577 申请日期 1999.02.25
申请人 UNITED MICROELECTRONICS CORP. 发明人 LAI, CHIEN-HSIN;YU, FU-YANG
分类号 C23C16/452;C23C16/455;(IPC1-7):C23C10/00;F17D1/04;F28C1/14 主分类号 C23C16/452
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