发明名称 |
Gas tube with heating apparatus |
摘要 |
A gas tube with heating apparatus. The gas tube is applicable in a chemical vapor deposition machine. The gas comprises a gas circulating tube and a coaxial gas tube invaginating a gas transporting tube therein. A heater is installed in the gas circulating tube, while the coaxial tube is covered by a thermal insulating layer. In addition, a control valve, a pressure gauge, and a particle trap are installed in a gas supplying tube connecting with the gas circulating tube.
|
申请公布号 |
US6129043(A) |
申请公布日期 |
2000.10.10 |
申请号 |
US19990257577 |
申请日期 |
1999.02.25 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
LAI, CHIEN-HSIN;YU, FU-YANG |
分类号 |
C23C16/452;C23C16/455;(IPC1-7):C23C10/00;F17D1/04;F28C1/14 |
主分类号 |
C23C16/452 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|