| 摘要 |
PROBLEM TO BE SOLVED: To provide film a forming device and a method therefor capable of the fine control of a film forming rate. SOLUTION: As to a hearth body 53, by a vessel body 53a and a cover part 53b, a space VS of a vapor pool is formed in the upper direction of a metallic fused soln. ML. Namely, the hearth body 53 is made into a crucible with a shape in which the opening is squeezed by an evaporating port 53c, by which the vapor pressure in the crucible, i.e., the space VS is made high, and the atmos or molecules composing the vapor is made into a cluster, which is emitted as a vapor beam CB consisting of cluster grains from the evaporating port 53c. Moreover, the vapor beam CB passes through the inside of a plasma atmosphere forming the plasma beam on the way of the progression toward a substrate, so that the cluster grains composing the vapor beam CB are activated and ionized and are deposited on the substrate, and film formation on the substrate progresses.
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