| 摘要 |
PROBLEM TO BE SOLVED: To efficiently wash a polishing pad by providing a mechanism for moving an arm between a polishing position and a rinse position for supplying the rinse fluid to the center of the polishing pad. SOLUTION: When an arm 213 is positioned at the polishing position, the arm 213 is separated from the center of a polishing pad 17. A board fitting head 29 and a conditioning head can be freely operated between ends and the center of the polishing pad 17 without being hindered by the arm 213. After the polishing, the arm 213 is positioned at the rinse position so that the ark 213 is extended from the end of the polishing pad 17 to the center of the polishing pad 17. Thereafter, a hinge 229 lowers the arm 213, and an optional brush 223 contacts with the polishing pad 17. The rinse fluid is supplied from a rinse fluid supply line 219 connected to a slurry/rinse arm 211 to the polishing pad 17. |
