| 摘要 |
An exposure method using coherent illuminating light, preventing interference fringes from being produced by the illuminating light on a reticle and further on a wafer, and improving the line width uniformity. Exposure illuminating light is projected onto a reticle through a fly-eye integrator (7) where multiple lens elements (7a) are arranged in contact with each other. A filter (100) having multiple filter elements corresponding to the lens elements (7a) is disposed near the light-incident surface of the fly-eye integrator (7). Different light-shielding patterns are provided on each set of adjacent two filter elements (100c, 100d) adjacent in the direction in which the arrangement pitches of the lens elements are short and which is indicated by arrow 22B, that is, in the direction in which interference fringes easily occur. |
