| 摘要 |
PROBLEM TO BE SOLVED: To easily expose photosensitive material having different sensitivity to such an extent that it can not be adjusted by the count number of exposure by performing the exposure in a state where a light source, an overlay filter, a press-fitted glass, an original film and the photosensitive material are arranged in this order from the top. SOLUTION: The exposure is performed in a state where a light source, the overlay filter, the press-fitted glass, original film and the photosensitive material are arranged in this order from the top. An exposing machine where the light source, the pressing glass, the original film and the photosensitive material can be set in order from the top is good as the exposing machine in this case. Any overlay filter can be used if it is uniform, but it is desirable to use the overlay filter that can form a large-sized one corresponding to the size of the photosensitive material. Furthermore, as for the desirable formation of the overlay filter in terms of simplicity, a method for producing the overlay filter by forming a specified pattern on a silver halide photosensitive film according to a light shielding area and light transmitted area by a printer is mentioned.
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