| 摘要 |
PROBLEM TO BE SOLVED: To prevent adhesion of the mist of processing liquid to a substrate when it is dried through spin system by performing a chemical processing process and a chemical drying process in same processing tank. SOLUTION: At first, spin system chemical cleaning process and rinsing process are performed by spin system in one spin cup 2 (Fig. a) and then spin system drying process is performed (Fig. b) after a substrate 5 is pushed up to be separated sufficiently from the upper edge of the spin cup 2. Since spin system drying process is performed at a position separated from the spin cup 2 being used for chemical cleaning process, re-adhesion of chemical mist to the substrate is prevented sufficiently and the number of residual particles on the substrate 5 can be decreased sufficiently.
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