发明名称 PLASMA PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To lessen a time required for transferring substrates so as to process a plurality of substrates at the same time. SOLUTION: A substrate 1 placed on a transfer tray 2 is transferred to a first vacuum standby chamber 4, a processing chamber 5, and a second vacuum standby chamber 13. The processing chamber 5 is equipped with movable chambers 6 and 11, and the movable chambers 6 and 11 are each brought into close contact with the transfer trays 2 to form plasma processing chambers 7 and 12. Different plasma processings are continuously carried out in the plasma processing chambers 7 and 12. The substrates 1 equal in number to the movable chambers 14 can be loaded into the vacuum standby chambers 4 and 13, and plasma processing can be carried out in plasma processing chambers 15.
申请公布号 JP2000277489(A) 申请公布日期 2000.10.06
申请号 JP19990078763 申请日期 1999.03.24
申请人 SHARP CORP 发明人 YAMAKAWA MASAYA;OKAMOTO MASAYA
分类号 H01L21/302;C23F4/00;H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/302
代理机构 代理人
主权项
地址