| 摘要 |
PROBLEM TO BE SOLVED: To allow pattern exposure at high resolution with a pattern of different density while the process tolerance is assured. SOLUTION: A pattern data input part 11, a pattern detecting part 12 which detects a pattern of the same density based on the pattern data, a processing simulation means 14 which performs exposure simulation for each detection pattern from the pattern detecting part 12 using a condition related to exposure, a condition setting means 15 which sets a condition for exposure operation using it, a judging part 16 which judges a pattern of the minimum tolerance, a mask bias operation part 17 wherein a combination calculation related to a condition for an exposure is performed for the pattern of the minimum tolerance judged at the judging part 16 as well as a pattern except for the pattern for operating a mask bias with maximum tolerance, and an output part 18, are provided. Here, a pattern exposure at high resolution is provided through a process wherein a target exposure pattern is divided and extracted into pattern parts of almost same density. |
