发明名称 SURFACE EMITTING SEMICONDUCTOR LASER AND MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a surface emitting semiconductor laser which is easy to manufacture having good reproducibility and having low threshold current, high output, and stable transverse modes, and to provide its manufacturing method. SOLUTION: A first mirror reflectance adjustment layer (phase adjustment and also current block layer) 8 has an opening 11 for exposing a contact layer 7 in a substrate plane, and a second mirror reflectance adjustment layer (phase adjustment and also electrode layer) 9 is laminated, at least on a part of the contact layer 7 in the opening 11 and on a part of the first reflectance adjustment layer 8. In a surface luminous type semiconductor laser, the contact layer 7 is of a conductive type which is different from that of the first reflectance adjustment layer 8.
申请公布号 JP2000277852(A) 申请公布日期 2000.10.06
申请号 JP19990079670 申请日期 1999.03.24
申请人 FUJI XEROX CO LTD 发明人 UEKI NOBUAKI
分类号 H01S5/00;H01S5/183;(IPC1-7):H01S5/183 主分类号 H01S5/00
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