发明名称 CHARGED PARTICLE BEAM EXPOSURE SYSTEM AND MANUFACTURE OF DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To improve producibility by arranging and storing an operation command for each deflection and an operation command for each sub-field on the same time series data. SOLUTION: A bit pattern of a clock as an operation command for each deflection and a bit pattern of a clock as an operation command for each sub- field are vritten in a clock pattern memory 459 in time series each. For example, a logic 1 is written at an interval equivalent to one deflection period as a bit pattern of a clock 391 supplied to an address counter 392 of a main deflector X. An address counter of a profiler of a driving element which sets driving data for each sub-field, that is, a focus coil address counter 419, a CLA address counter 368, an astigmatic coil address counter 431, a magnification coil address counter 439 and clocks 418, 367, 430, 438, 443 supplied to an MOL coil address counter 444 also write the logic 1 for each sub-field.
申请公布号 JP2000277417(A) 申请公布日期 2000.10.06
申请号 JP19990081448 申请日期 1999.03.25
申请人 CANON INC 发明人 YUI TAKASUMI;MURAKI MASATO
分类号 H01J37/305;G03F7/20;H01J37/302;H01J37/317;H01L21/027;(IPC1-7):H01L21/027 主分类号 H01J37/305
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