发明名称 SUBSTRATE CONVEYOR AND VACUUM TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate conveyor in which the misalignment and falling of a substrate during the turn and expansion-contraction operation of the substrate conveyor can be prevented effectively, and to provide a vacuum treatment apparatus. SOLUTION: A substrate stopper 3 in which the unified first arm 8 and second arm 9 are rotated centering around a shaft 4 is installed at the front end sections of two each supporting arm A2. A glass substrate 7 is loaded and held thereon in an approximately U-shaped hand 1, the front end section 6 of the second arm 9 is positioned at a place lower than the pad 5 made of a resin of the first arm 9 when the glass substrate 7 is not held, the first arm 8 is pushed down through the pad 5 made of the resin by the weight of the glass substrate 7, an the front end section 6 of the second arm 9 jumps up to a place higher than the top face of the glass substrate 7 through the shaft 4 when the substrate 7 is held.
申请公布号 JP2000277585(A) 申请公布日期 2000.10.06
申请号 JP19990077362 申请日期 1999.03.23
申请人 HITACHI LTD 发明人 NOMURA HIDEJI
分类号 H01L21/677;C23C14/56;C23C16/44;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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