发明名称 METHOD AND DEVICE FOR MEASURING REFLECTIVITY AND TEMPERATURE, AND FOR PROCESSING SUBSTRATE HEAT
摘要 PROBLEM TO BE SOLVED: To accurately measure the reflectivity of a substrate by acquiring a substrate reflectivity (substrate emissivity) based on on-time intensity signal and off-time intensity signal which are switched between turned-on state and turned-off state. SOLUTION: An auxiliary lamp 572c is always turned on, and, with a rotative sector for switching effective reflectivity R1 and R2 provided, an auxiliary sector 572a for switching the light-emission from the upper end of an optical fiber 56b between turned-on state and turned-off state, is rotated. A detection part 571 measures emission intensities I0, I1, and IL. A reflectivity pW of a process substrate W is calculated from the emission intensities I0, I1, and IL, and further, effective reflectivity R1 and R2 are acquired using a conversion table corresponding to this kind of a process substrate W acquired already, from the reflectivityρW. Then the process substrate W is thermally processed. Here, a temperature T of the process substrate W is calculated using measured emission intensities I1 and I2 as well as acquired effective reflectivity R1 and R2, and a control part 60 controls a lamp based on the temperature T for temperature-control the substrate W.
申请公布号 JP2000277446(A) 申请公布日期 2000.10.06
申请号 JP19990079801 申请日期 1999.03.24
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SASAKI KIYOHIRO;NOZAKI KIMIHIDE
分类号 H01L21/26;(IPC1-7):H01L21/26 主分类号 H01L21/26
代理机构 代理人
主权项
地址