发明名称 METHOD FOR PROCESSING SURFACE OF OPTICAL DEVICE BY ION BEAM ETCHING
摘要 A highly reliable optical device fabricated by irradiating the surface of a mechanically polished crystal optical with an ion beam to remove the surface layer having residual abrasive grains. Laser damage to the optical element is prevented to enhance the resistance of the element surface to the laser beam and to prolong the life.
申请公布号 WO0058783(A1) 申请公布日期 2000.10.05
申请号 WO1999JP05013 申请日期 1999.09.14
申请人 JAPAN SCIENCE AND TECHNOLOGY CORPORATION;KOGAKUGIKEN CO., LTD.;SASAKI, TAKATOMO;MORI, YUSUKE;TANAKA, MITSUHIRO 发明人 SASAKI, TAKATOMO;MORI, YUSUKE;TANAKA, MITSUHIRO
分类号 B23K15/00;G02B1/02;G02B1/12;G02F1/35;G02F1/355;(IPC1-7):G02F1/35 主分类号 B23K15/00
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