APPARATUS FOR MANUFACTURING SEMICONDUCTOR WAFER

摘要

A compact apparatus for manufacturing semiconductor wafers is provided to completely remove moisture from semiconductor wafers subjected to final washing while reducing the manufacturing time. The apparatus comprises a washing chamber (1) for final wafer washing; a storage chamber (3) for temporarily storing wafers; a transfer chamber (2) communicating with the washing chamber (1) and the storage room (3) and provided with a heat-conducting quartz window (7) on top; a robot hand (5) and a robot arm (4) that transfer wafers (W) from the washing chamber (1) to the storage chamber (3) in the transfer chamber; an infrared lamp (6) arranged to face the quartz window (7) outside the transfer chamber (2) for heating wafers (W) to a predetermined temperature; gas supply means (8) for producing a laminar flow of inert gas from the storage chamber (3) to the washing chamber (1) to expose wafers (W) with the gas; and exhaust means (9) for discharging the transfer chamber that contains the moisture removed from wafers.