Lithography device for production of semiconductor or micro- mechanical structures generates a mash for illuminating a photosensitive circuit by creation of a bitmap using software, which bitmap can then be illuminated with UV light

摘要

System in which an exposure layout is produced virtually and a virtual reticule or transparent mask is made using a software pattern or bitmap of pixels where the gray values are any of 256 values. After production of a pixel map it is portrayed as an LCD panel which is then illuminated using UV light so that a photosensitive surface is exposed. This surface is then etched in a conventional way.