| 摘要 |
PURPOSE: An apparatus for baking photoresist on a semiconductor wafer is to preventing an introducing of cool air into a baking apparatus, thereby increasing an yield and a productivity of a product. CONSTITUTION: An apparatus for baking photoresist on a semiconductor wafer comprises a chamber(100), a heating plate(20) disposed in the chamber to heating a wafer(80), an oven cover(30) for covering the heating plate to reduce a heat loss, and a high temperature injecting portion for injecting high temperature air on the heating plate when the wafer to be baked is loaded on the heating plate. In the apparatus, the high temperature injecting portion is comprised of an air supplying portion(60), an inner space(32) formed at the oven cover, a connecting line(64) for connecting the inner space of the oven cover and the air supplying portion, a plurality of holes formed at a side of the oven cover corresponding to the heating plate to be communicated with the inner space, and a heating device(62) disposed at the line to heat the air supplied to the inner space of the oven cover.
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