发明名称 TRANSPARENT, IMPACT-RESISTANT POLYSTYRENE ON A STYRENE-BUTADIENE BLOCK COPOLYMER BASIS
摘要 <p>The invention relates to block copolymers comprising at least two hard blocks S1 and S2 consisting of vinyl aromatic monomers and at least one random soft block B/S which is positioned between the hard blocks and consists of vinyl aromatic monomers and dienes. The proportion of hard blocks is more than 40 % by weight of the total block copolymer.</p>
申请公布号 WO2000058380(A1) 申请公布日期 2000.10.05
申请号 EP2000002568 申请日期 2000.03.23
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